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Self-Aligned Deposition via Spin Coating without Pretreatment

A spin dewetting technique that reduces the patterning process time

Published: 19th July 2022
Self-Aligned Deposition via Spin Coating without Pretreatment
narong, https://stock.adobe.com/uk/285374182, stock.adobe.com
IP Status
  • Patent application submitted
Seeking
  • Licensing